Vacuum ultraviolet emission from mixed H2:Ar/Ne/He plasmas

Josef L. Richmond*, Joshua R. Machacek, Christine Charles, Roderick W. Boswell

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The emission of mixed inert/reactive gas plasmas, commonly used in a variety of industrial applications and laboratory settings, is relatively unquantified in the vacuum ultraviolet (VUV) wavelength range. VUV emission spectroscopy of mixed H2:Ar/Ne/He inductively coupled radio frequency (RF) plasmas was conducted for pressures in the range 20-80 mTorr with 400 W input RF power and H2 concentrations of 0% to 100%. For H2:Ar mixtures at 80 mTorr, the Ly- α (121 nm) emission was observed to reach a maximum at 27.5% H2: 72.5%Ar, approximately 3.3 × greater than a pure hydrogen discharge at the same pressure, and the total emission in the range 115-200 nm increased by a factor of 1.5. By increasing the pressure at which the mixtures were maintained, the maximum Ly- α emission was increased, and the H2 concentration at which that maximum occurred decreased. Comparisons to a simple collisional model indicate a significant pressure dependence, which is consistent with observations of self-absorption of Ly- α by ground state hydrogen atoms. Experiments across the full range of H2:Ar/Ne/He mixtures revealed that admixed gases with heavier atomic masses are more effective at increasing the Ly- α emission. A similar pressure dependence was also observed, indicating self-absorption phenomena are still highly relevant to emission spectroscopy of mixed hydrogen/inert gas plasmas. The development of high efficiency sources in the VUV wavelength range is especially useful for space applications where there is no atmospheric absorption of the VUV.

Original languageEnglish
Article number013508
Number of pages11
JournalPhysics of Plasmas
Volume32
DOIs
Publication statusPublished - Jan 2025

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