Value and Anisotropy of the Electron and Hole Mass in Pure Wurtzite InP Nanowires

D. Tedeschi, M. De Luca, A. Granados Del Águila, Q. Gao, G. Ambrosio, M. Capizzi, H. H. Tan, P. C.M. Christianen, C. Jagadish, A. Polimeni*

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    16 Citations (Scopus)

    Abstract

    The effective mass of electrons and holes in semiconductors is pivotal in determining the dynamics of carriers and their confinement energy in nanostructured materials. Surprisingly, this quantity is still unknown in wurtzite (WZ) nanowires (NWs) made of III-V compounds (e.g., GaAs, InAs, GaP, InP), where the WZ phase has no bulk counterpart. Here, we investigate the magneto-optical properties of InP WZ NWs grown by selective-area epitaxy that provides perfectly ordered NWs featuring high-crystalline quality. The combined analysis of the energy of free exciton states and impurity levels under magnetic field (B up to 29 T) allows us to disentangle the dynamics of oppositely charged carriers from the Coulomb interaction and thus to determine the values of the electron and hole effective mass. By application of B - along different crystallographic directions, we also assess the dependence of the transport properties with respect to the NW growth axis (namely, the WZ ĉ axis). The effective mass of electrons along ĉ is me∥ = (0.078 ± 0.002) m0 (m0 is the electron mass in vacuum) and perpendicular to ĉ is me = (0.093 ± 0.001) m0, resulting in a 20% mass anisotropy. Holes exhibit a much larger (∼320%) and opposite mass anisotropy with their effective mass along and perpendicular to ĉ equal to mh = (0.81 ± 0.18) m0 and mh = (0.250 ± 0.016) m0, respectively. While no full consensus is found with current theoretical results on WZ InP, our findings show trends remarkably similar to the experimental data available in WZ bulk materials, such as InN, GaN, and ZnO.

    Original languageEnglish
    Pages (from-to)6213-6221
    Number of pages9
    JournalNano Letters
    Volume16
    Issue number10
    DOIs
    Publication statusPublished - 12 Oct 2016

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