Abstract
Thermal interdiffusion is used to shift peak response wavelength of quantum well infrared photodetectors. A maximum 0.7μm red-shift for 900°C annealed devices compared with as-grown one has been obtained. Error function potential profile is used to calculate the intermixing process. The large red-shift is attributed to Si-dopant enhanced intermixing. Dark current is decreased about 5 times for 900°C annealed sample than as-grown one, which is attributed to Si-dopant out-diffusion. The experimentally observed reduction in the responsivity is attributed to out-diffusion of Si-dopant and degradation of interfaces.
| Original language | English |
|---|---|
| Pages (from-to) | 5044-5045 |
| Number of pages | 2 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 38 |
| Issue number | 9 A |
| DOIs | |
| Publication status | Published - 1999 |
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